Financial Report 2009
- Start page
- 2009 in brief
- History
- Statement of the Chairman of the Board
- Statement of the CEO
- About Obducat
- Outlook
- Market
- Technology, development, patents and products
- Employees
- Sustainability, environment, ethics
- Five year review
- Key ratios
- Share capital and ownership structure
- Corporate Governance
- Financial Reports
- Affirmation
- Audit Report
- Board of Directors
- Management
- Financial Calendar
- Contacts
- About the Annual Report
SEM
SEM
EB, Electron Beam Technology, comprises Scanning Electron Microscopes, SEM, and Electron Beam Columns, EBR. Both are developed and produced by Obducat CamScan in England. EBR is first and foremost a significant part of Obducat’s NIL technology, since it is used to create the original, nanometre scale pattern on the stamp. Obducat’s EBR system is distinguished by its unique rotational direction, making the system very fast and robust. Development of the next generation is well under way to allow for further increased resolution and the ability to manage data for large patterned areas. The market for high resolution systems for rapid generation of imprint stamps increases concurrently with many new application areas for patterning of areas emerging.
SEM is a well-established tool with general applications in inspection and analysis of very small structures and details. Obducat’s Scanning Electron Microscopes, including the Apollo series (using thermal field emission, TFE) and CS as main platforms, have been of great use in a wide range of application areas. In addition to materials science, they are used in e.g. forensic analysis, Gun Shot Residue (GSR), different nanotechnical applications, and microscopy in earth science. The X500 Crystal Probe is used in metallurgy, for instance.