Obducat

Financial Report 2009

About Obducat

NIL – A FLEXIBLE, ACCURATE AND COST-EFFECTIVE TECHNOLOGY

Nanotechnology is a comprehensive term for a technology size which is best described in nanometres – billionth of metres. In most cases it is a question of very advanced technology, and the application opportunities are immense. With Obducat’s nanoimprint lithography (NIL), large-scale production of nanometre-sized structures has reached an entirely new level of flexibility and cost-efficiency. Almost inconceivably small structures can be produced and replicated with nanometre accuracy. This means that on the one hand, development is approaching the bounds of what is physically possible (one common atom is approximately 0.2 nanometres in diameter), and on the other hand, an unprecedented efficiency per unit area. This area efficiency, combined with the tailored properties that the design of the material itself creates, is much sought after in numerous applications.

Accurate nanoscale sculpting

In all high technology production there are extremely high demands on manufacturing accuracy – a must if the required functionality is to be achieved. Equally important, in order to be an attractive commercial option, is the ability to rapidly, accurately and cost-effectively repeat the procedure, such as replicating a pattern. Obducat’s ingenious technology enables very complex, three-dimensional pattern structures to be transferred from an original pattern, a stamp, to a designated surface (substrate), rapidly and accurately every time. There are several methods for duplicating nanostructures, but NIL technology is pre-eminent with regard to both costs and resolution. In the long run NIL will enable smaller, better and cheaper products in optics and electronics as well as energy and magnetic storage. Absolutely in accordance with Obducat’s motto, Creating Greater Capacity on Smaller Spaces.

Originals and replicas from the same supplier – Obducat

Obducat provides lithography systems for the production and replication of micro and nanostructures. These production solutions are based on a number of patented technologies. Obducat believes that NIL and EB (electron beam technology; an area comprising both scanning electron microscopy, SEM, and electron beam columns, EBR) are those with the high technological level and the best opportunity to achieve full-scale commercialisation. The very combination of these technologies makes Obducat unique. No competitor has both technologies at their disposal, both of which are vital for the production of stamps as well as the replication technique itself, in this case NIL. In addition, the cost-effectiveness of EBR is superior to that of conventional EBL technology (electron beam lithography), as is also its accuracy when exposed over large surfaces. Being able to provide the customer with a total lithography solution is vitally important, and from this perspective Obducat estimates its position to be especially strong.

Fewer process steps lower the cost

With reference to NIL technology, there are primarily two types of NIL. One is based on so-called step and repeat, which means that a small area is imprinted one at the time. The other one is full area, which means that a larger stamp is used, imprinting the entire pattern in one process step. The difficulty of full area is achieving pressure uniformity over the entire imprint area. Obducat solves this particular problem with its patented Soft Press® technology, which presents a number of advantages compared with competing technologies. Using full area imprint allows for higher production speed and lower costs. Obducat’s patented stamp surface treatment processes are also conducive to high throughput and low scrap costs.